Xueqiang Zhang,a† Chen-Guang Wang,b† Wei Ji,b* Sylwia Ptasinskac*
a. Radiation Laboratory, Department of Chemistry and Biochemistry, University of Notre Dame, Notre Dame, IN 46556, USA.
b. Department of Physics, Beijing Key Laboratory of Optoelectronic Functional Materials & Micro-nano Devices, Beijing 100872 (China), E-mail: firstname.lastname@example.org
c. Radiation Laboratory, Department of Physics, University of Notre Dame, Notre Dame, IN 46556, USA, E-mail: email@example.com
DOI:10.1039/C6CC09961K Publication Date:
Dissociative adsorption of CH3NO2 onto a Si(100)-2×1 surface is studied using ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) and density functional theory (DFT) calculations. The unprecedented scission of the C-N bond in CH3NO2, and the formation of a Si-CH3 surface species are observed at elevated CH3NO2 pressure (0.5 mbar) and temperature (>573 K).